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Message ID: 244     Entry time: Friday, September 27, 2019, 18:04
Author: Marla Cervantes 
Target Material: UC2 
Target Oven W.O#: 44062-4 
Source: LP-SIS 
Status: Done 
Subject: UCx28 Conditioning #4 

Friday, September 27, 2019, 18:03

The target UCx28 that was previously conditioned , was set again in the EVAP1 for re-conditioning,

the reason was to get rid of all the material that could evaporate from the target and has the potential of clogging the ionizer.

EVAP1 currently pumping down.


Saturday, September 28, 2019, 09:33 

The heating conditions are the same as the previous conditioning:

TGHT= 1 A/min to 438 A (same current used to reach 1900C in evap2 when sintering TaC coating - elog-455 evap2)

TBHT= 1 A/min 230 A

IGP1 = 1.419e-6 Torr

The ramping started at 9:36 am on Septemper 28th 


Sunday, September 29, 2019, 12:30

The cooling conditions are the same as the previous conditioning:

TGHT= -1 A/min 

TBHT= -0.5 A/min


Monday, September 30, 2019, 11:40 

After 23 hours being heated, the target was cooled down and EVAP1 was vented with Ar

The target was removed form EVAP1 and placed in the fumehood.

The tantalum cap used to collect the outgassed material from the target container was not fully coated.


The heat shields of the target container were removed and the target container was inspected,

the ends of the Ta container were crystallized, the area above the graphite cartridge does not have signs of crystallization. 

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